NDLI: Structure verification on photolithographic masks based on tolerance criteria by cellular neural networks

Content Provider	IEEE Xplore Digital Library
Author	Schwarz, S. Pohl, A. Mathis, W.
Copyright Year	1996
Description	Author affiliation: Dept. of Electr. Eng., Wuppertal Univ., Germany (Schwarz, S.)
Abstract	First of all, the problem of structure verification is introduced with respect to tolerance criteria and their verifications. After that, the basic principle of a verification method for cellular neural networks is motivated by means of local restrictions. Then their solution is presented on the basis of local operators which are only designed with the help of local restrictions of the design rules of the mask structures and their tolerance zones. After that, the result of the successful use of the method is demonstrated on manufacturing and calibration masks. Finally, the debate discusses the competitive position of the method with reference to two standard methods. Last of all, the summary indicates future improvements.
Starting Page	145
Ending Page	149
File Size	311879
Page Count	5
File Format	PDF
ISBN	078033261X
DOI	10.1109/CNNA.1996.566510
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1996-06-24
Publisher Place	Spain
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Cellular neural networks Neural networks Manufacturing Inspection Image processing Cellular networks Computer networks Electronic circuits Calibration Lithography
Content Type	Text
Resource Type	Article

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Structure verification on photolithographic masks based on tolerance criteria by cellular neural networks