NDLI: Reconvergent specular detection of material defects on silicon

Content Provider	IEEE Xplore Digital Library
Author	Ferrara, M.B. Welch, K.A. Clementi, L.D. Hunt, J.D. Wolter, S.D. Bates, E.C.
Copyright Year	1995
Description	Author affiliation: ADE Opt Syst. Corp., Charlotte, NC, USA (Ferrara, M.B.; Welch, K.A.; Clementi, L.D.; Hunt, J.D.; Wolter, S.D.; Bates, E.C.)
Abstract	The ability to detect and classify material defects, such as epitaxial stacking faults, and pits in the surface region of silicon substrates is rapidly gaining importance as an additional wafer evaluation criterion. Traditionally, surface scanning inspection systems (SSIS) have been utilized to detect and quantify particulate contamination in process control applications. This study investigates the ability to detect and image these material defects using an enhanced SSIS. The imaging apparatus studied for this unique method operates concurrently with the conventional mode of operation for particle detection which relies on light scattering events. In the case of imaging material defects, a loss in the reflected light source beam intensity is measured. This technique, reconvergent specular detection (RSD), samples the reflected beam and is more commonly known as light channel detection. Stacking faults, pits, and slurry residue, common defect features on silicon, are examined in this study using the light channel detector. This work establishes that these types of defects are difficult to quantify when restricted to conventional detection methods. The light channel detection method, however, is capable of accurately imaging these defects according to size and shape. This paper highlights these results explains light channel phenomena in terms of detection theory and defect surface area. This novel imaging method offers a means of both detecting material defects and classifying them.
Starting Page	136
Ending Page	140
File Size	947104
Page Count	5
File Format	PDF
ISBN	0780327136
ISSN	10788743
DOI	10.1109/ASMC.1995.484355
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1995-11-13
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Silicon Fault detection Stacking Surface contamination Substrates Inspection Process control Event detection Light scattering Light sources
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Electrical and Electronic Engineering Electronic, Optical and Magnetic Materials

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
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7	National Digital Libarray of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
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9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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