NDLI: Growth and characterization of Mg$_{ x }$Zn$_{1−x }$O thin films by aerosol-assisted chemical vapor deposition (AACVD)

Content Provider	SpringerLink
Author	Shukla, Akash Kaushik, Vipin K. Prasher, Dixit
Copyright Year	2014
Abstract	The growth and characterization of Mg$_{ x }$Zn$_{1−x }$O thin films by aerosol-assisted chemical vapor deposition (AACVD) technique is reported in this paper. We have grown the thin films of ZnO by adding varying concentrations of magnesium (Mg) on a glass substrate. The precursor from which the Mg$_{ x }$Zn$_{1−x }$O thin films were grown was made up of a mixture of zinc acethylacetonate and magnesium acetate tetrahydrate in boiled isopropyl alcohol. Oxygen gas was used as a carrier gas and substrate temperature was maintained at 400°C. Mg$_{ x }$Zn$_{1−x }$O thin films were finally characterized by x-ray diffraction (XRD), atomic force microscopy (AFM) and UV-VIS-NIR spectroscopy. XRD results show that Mg$_{ x }$Zn$_{1−x }$O thin films displayed a wurtzite structure and addition of Mg leads to a slight shift towards higher 2-theta values. AFM results show that MgZnO thin films were uniformly covered with nano flakes and their size decreases with an increase in Mg content. Optical studies show that with the increase of Mg content, transparency as well energy band gap of the Mg$_{ x }$Zn$_{1−x }$O thin films increases, which also agrees with the reported values.
Starting Page	61
Ending Page	65
Page Count	5
File Format	PDF
ISSN	17388090
Journal	Electronic Materials Letters
Volume Number	10
Issue Number	1
e-ISSN	20936788
Language	English
Publisher	Springer Netherlands
Publisher Date	2014-01-10
Publisher Place	Dordrecht
Access Restriction	Subscribed
Subject Keyword	ZnO Mg$_{ x }$Zn$_{1−x }$O MgZnO thin films CVD XRD Optical and Electronic Materials Condensed Matter Physics Nanotechnology and Microengineering Characterization and Evaluation of Materials Nanotechnology
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials

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