NDLI: Variability-aware NoC geometry and topology scaling

Content Provider	IEEE Xplore Digital Library
Author	Gawish, E.K. El-Kharashi, M.W. Abu-Elyazeed, M.F.
Copyright Year	2013
Description	Author affiliation: Electron. & Electr. Commun. Eng. Dept., Cairo Univ., Cairo, Egypt (Gawish, E.K.; Abu-Elyazeed, M.F.) \|\| Mentor Graphics, Cairo, Egypt (El-Kharashi, M.W.)
Abstract	In this paper we study the effects of geometry and topology scaling on electrical properties variations among NoC links designed to be identical. The modeled process systematic and random variations of current in CM interconnect, as well as delay variations in VM interconnect are calculated as interconnect, device and mesh size scale at 45 nm. Results show that device geometry scaling mainly affects the current variations. On the other hand, interconnect geometry scaling affects both current and delay variations. Scaling the mesh size will not affect random variations. On the other hand as the NoC mesh size scales from 4×4 to 16×16, the CM interconnect systematic current variations increases by 100%, while the VM systematic delay variations increases by 50% .
Sponsorship	IEEE Western Saudi Arabia Sect.
Starting Page	1
Ending Page	6
File Size	713789
Page Count	6
File Format	PDF
ISBN	9781467361965
e-ISBN	9781467361958
e-ISBN	9781467361941
DOI	10.1109/SIECPC.2013.6550789
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2013-04-27
Publisher Place	Greece
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Geometry Current-mode interconnect Systematics Voltage-mode interconnect Integrated circuit interconnections Logic gates Capacitance Process variability Delays Mathematical model Networks-on-chip
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Mr. Siddhartha Mukherjee siddhartha@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	ndl-support@iitkgp.ac.in
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