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Author Bhuyan, M. K. ♦ Courvoisier, F. ♦ Lacourt, P. A. ♦ Jacquot, M. ♦ Salut, R. ♦ Furfaro, L. ♦ Dudley, J. M.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword NANOSCIENCE AND NANOTECHNOLOGY ♦ ABLATION ♦ ASPECT RATIO ♦ FABRICATION ♦ GLASS ♦ LASER RADIATION ♦ MACHINING ♦ MEMBRANES ♦ NANOSTRUCTURES ♦ PERIODICITY ♦ PITCHES ♦ PULSED IRRADIATION ♦ DIMENSIONLESS NUMBERS ♦ ELECTROMAGNETIC RADIATION ♦ IRRADIATION ♦ ORGANIC COMPOUNDS ♦ OTHER ORGANIC COMPOUNDS ♦ RADIATIONS ♦ VARIATIONS
Abstract We report high aspect ratio nanochannel fabrication in glass using single-shot femtosecond Bessel beams of sub-3 {mu}J pulse energies at 800 nm. We obtain near-parallel nanochannels with diameters in the range 200-800 nm, and aspect ratios that can exceed 100. An array of 230 nm diameter channels with 1.6 {mu}m pitch illustrates the reproducibility of this approach and the potential for writing periodic structures. We also report proof-of-principle machining of a through-channel of 400 nm diameter in a 43 {mu}m thick membrane. These results represent a significant advance of femtosecond laser ablation technology into the nanometric regime.
ISSN 00036951
Educational Use Research
Learning Resource Type Article
Publisher Date 2010-08-23
Publisher Place United States
Journal Applied Physics Letters
Volume Number 97
Issue Number 8


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