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Author Schuessler, M. ♦ Statzner, T. ♦ Lin, C. I. ♦ Krozer, V. ♦ Horn, J. ♦ Hartnagel, H. L.
Sponsorship USDOE
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword MATERIALS SCIENCE ♦ ENGINEERING NOT INCLUDED IN OTHER CATEGORIES ♦ PALLADIUM ♦ ELECTRODEPOSITION ♦ TITANIUM ♦ GERMANIUM ♦ SCHOTTKY BARRIER DIODES ♦ FABRICATION ♦ THICKNESS ♦ ELECTRODEPOSITED COATINGS ♦ TITANIUM CHLORIDES ♦ PALLADIUM CHLORIDES ♦ GALLIUM ARSENIDES ♦ INDIUM ARSENIDES
Abstract The electrolytic deposition of Pd, Ti, and Ge is demonstrated. A process for depositing smooth surfaces of layers from 10 to 100 nm and thicker is described. Applications of this technology for Schottky and ohmic contacts are shown and the advantages to similar evaporated metallization schemes are listed.
ISSN 00134651
Educational Use Research
Learning Resource Type Article
Publisher Date 1996-04-01
Publisher Place United States
Journal Journal of the Electrochemical Society
Volume Number 143
Issue Number 4


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