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Author Choudhary, Sumita ♦ Sarma, J. V. N. ♦ Gangopadhyay, Subhashis
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword MATERIALS SCIENCE ♦ ABSORPTION SPECTROSCOPY ♦ COPPER ♦ COPPER OXIDES ♦ CRYSTAL GROWTH ♦ CRYSTAL STRUCTURE ♦ ENERGY GAP ♦ EVAPORATION ♦ GLASS ♦ GRAIN SIZE ♦ OXIDATION ♦ SCANNING ELECTRON MICROSCOPY ♦ TEMPERATURE DEPENDENCE ♦ THIN FILMS ♦ ULTRAVIOLET SPECTRA ♦ VISIBLE SPECTRA ♦ X-RAY DIFFRACTION ♦ X-RAY PHOTOELECTRON SPECTROSCOPY
Abstract We report a simple and efficient technique to form high quality single phase cuprous oxide films on glass substrate using thermal evaporation of thin copper films followed by controlled thermal oxidation in air ambient. Crystallographic analysis and oxide phase determination, as well as grain size distribution have been studied using X-ray diffraction (XRD) method, while scanning electron microscopy (SEM) has been utilized to investigate the surface morphology of the as grown oxide films. The formation of various copper oxide phases is found to be highly sensitive to the oxidation temperature and a crystalline, single phase cuprous oxide film can be achieved for oxidation temperatures between 250°C to 320°C. Cu{sub 2}O film surface appeared in a faceted morphology in SEM imaging and a direct band gap of about 2.1 eV has been observed in UV-visible spectroscopy. X-ray photoelectron spectroscopy (XPS) confirmed a single oxide phase formation. Finally, a growth mechanism of the oxide film has also been discussed.
ISSN 0094243X
Educational Use Research
Learning Resource Type Article
Publisher Date 2016-04-13
Publisher Place United States
Volume Number 1724
Issue Number 1


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