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Author Woodyard, J. R. ♦ Cooper, C. B.
Sponsorship USDOE
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword PHYSICS ♦ ARGON ♦ ATOMS ♦ CONFINEMENT ♦ COPPER ♦ CRYSTALS ♦ CURRENTS ♦ DENSITY ♦ DETECTION ♦ EFFICIENCY ♦ ELECTRIC ARCS ♦ ELECTRIC POTENTIAL ♦ ENERGY RANGE ♦ EV RANGE ♦ ION BEAMS ♦ IONS ♦ MAGNETIC FIELDS ♦ MASS ♦ MASS SPECTROMETERS ♦ MOLECULES ♦ SENSITIVITY ♦ SPUTTERING ♦ TARGETS
Abstract A low-pressure magnetically confined argon arc discharge was used in a mass spectrometer ion source to study low-energy (0 to 100 ev) sputtering of polycrystalline copper. Target bombarding ion current densities ranged from 60 to 200 mu A/cm/sup 2/. Neutral particles were studied. Cu atoms and Cu/sub 2/ molecules were detected. The mass ratio of analyzed Cu/sub 2/ molecules to Cu atoms increased with bombarding ion energies to about 51/2% at ion energies of 100 ev. Target voltages for appearance of Cu atoms and Cu/sub 2/ molecules were - 19 and -50 v, respectively. No Cu/sub 3/ molecules were detected; if they were present, it was estimated that the ratio /sup 189/Cu/sub 3/ to Cu/sup 63/ is less than 0.09%. The method was found to be promising for the study of neutral particles in low-energy sputtering. Yield curves agree well with results of other observers; sensitivities of 7 x 10/sup -4/ atoms/ion were attained, and this figure can be improved. (auth)
ISSN 00218979
Educational Use Research
Learning Resource Type Article
Publisher Date 1964-04-01
Publisher Department Univ. of Delaware, Newark
Journal Journal of Applied Physics
Volume Number 35
Organization Univ. of Delaware, Newark


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