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Author Hsu, L.
Sponsorship Taiwan Semiconductor Ind. Assoc. ♦ IEEE Electron Devices Soc. Taipei Chapter
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
File Format PDF
Copyright Year ©2004
Language English
Subject Domain (in DDC) Technology ♦ Engineering & allied operations ♦ Applied physics
Subject Keyword Lithography ♦ Optical design ♦ Costs ♦ Silicon ♦ Time to market ♦ Flexible manufacturing systems ♦ Optical scattering ♦ Manufacturing processes ♦ Force control ♦ Pressure control
Abstract Increasing market pressures force design and manufacturing communities to come up with innovative and flexible design and manufacturing solutions to control cost and time to market. This work shows that optical maskless lithography (OML), requiring no mask at all, has lowest cost and shortest design-to-wafer times while keeping transparency to mask-based optical lithography and allowing for resolution enhancement via known low-k/sub 1/ imaging methods such as hard phase shifting and strong OPC.
Description Author affiliation: United Microelectron. Corp., Hsinchu, Taiwan (Hsu, L.)
ISBN 0780384695
Educational Role Student ♦ Teacher
Age Range above 22 year
Educational Use Research ♦ Reading
Education Level UG and PG
Learning Resource Type Article
Publisher Date 2004-09-09
Publisher Place Taiwan
Rights Holder Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Size (in Bytes) 284.68 kB
Page Count 4
Starting Page 115
Ending Page 118


Source: IEEE Xplore Digital Library