Thumbnail
Access Restriction
Subscribed

Author Vig, J.R.
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
File Format PDF
Copyright Year ©1990
Language English
Subject Domain (in DDC) Technology ♦ Engineering & allied operations ♦ Applied physics
Subject Keyword Frequency control ♦ Electronics industry ♦ Industrial control ♦ Surface cleaning ♦ Manufacturing industries ♦ Semiconductor device manufacture ♦ Paper technology ♦ Semiconductor devices ♦ Surface contamination ♦ Filters
Abstract The author reviews a selection of papers from the First International Symposium on Cleaning Technology in Semiconductor Device Manufacturing (held in October 1989) which is applicable to frequency control device processing. The topics of the 43 papers presented included wet cleaning technologies, dry cleaning technologies, particles and airborne contaminants, and the characterization of cleaning. A table of organic contaminants in clean rooms is given. The evolution of particle control requirements is discussed.<<ETX>>
Description Author affiliation: US Army Electron. Technol. & Devices Lab., Fort Monmouth, NJ, USA (Vig, J.R.)
Educational Role Student ♦ Teacher
Age Range above 22 year
Educational Use Research ♦ Reading
Education Level UG and PG
Learning Resource Type Article
Publisher Date 1990-05-23
Publisher Place USA
Rights Holder Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Size (in Bytes) 465.48 kB
Page Count 6
Starting Page 201
Ending Page 206


Source: IEEE Xplore Digital Library