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Author Bunday, B. ♦ Allgair, J. ♦ Caldwell, M. ♦ Archie, C. ♦ Solecky, E. ♦ Rice, B. ♦ Singh, B. ♦ Emami, I.
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
File Format PDF
Copyright Year ©2006
Language English
Subject Domain (in DDC) Technology ♦ Engineering & allied operations ♦ Applied physics
Subject Keyword Metrology ♦ Measurement uncertainty ♦ Monitoring ♦ Measurement errors ♦ Productivity ♦ Semiconductor device manufacture ♦ Lithography ♦ Etching ♦ Scanning electron microscopy ♦ Calibration
Abstract The conventional premise that metrology is a "non-value-added necessary evil" is a misleading one, which must be viewed as obsolete thinking. Much of the metrology requirements are now key enablers to traditionally labeled "value-added" processing steps in lithography and etch, such that they can be considered integral parts of the processes. This paper explore the present and future trends and challenges in CD metrology. However, equipment is only part of the battle. The quality application of these tools in a production environment is quite important; the ultimate value-added by metrology is a result of quality tools run by a quality metrology team using quality practices.
Description Author affiliation: Int. SEMATECH Manuf. Initiative, Austin (Bunday, B.)
ISBN 9784990413804
ISSN 1523553X
Educational Role Student ♦ Teacher
Age Range above 22 year
Educational Use Research ♦ Reading
Education Level UG and PG
Learning Resource Type Article
Publisher Date 2006-09-25
Publisher Place Japan
Rights Holder ISSM
Size (in Bytes) 3.12 MB
Page Count 4
Starting Page 387
Ending Page 390


Source: IEEE Xplore Digital Library