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Author Ohmi, T.
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
File Format PDF
Copyright Year ©1993
Language English
Subject Domain (in DDC) Technology ♦ Engineering & allied operations ♦ Applied physics
Subject Keyword Ultra large scale integration ♦ Manufacturing ♦ Silicon ♦ Oxidation ♦ Epitaxial growth ♦ Annealing ♦ CMOS technology ♦ Temperature ♦ Copper ♦ Surface resistance
Description Author affiliation: Tohoku University (Ohmi, T.)
Educational Role Student ♦ Teacher
Age Range above 22 year
Educational Use Research ♦ Reading
Education Level UG and PG
Learning Resource Type Article
Publisher Date 1993-09-20
Publisher Place USA
Rights Holder Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Size (in Bytes) 1.10 MB


Source: IEEE Xplore Digital Library