Thumbnail
Access Restriction
Subscribed

Author Bostan, C.G. ♦ de Ridder, R.M. ♦ van Dorssen, I. ♦ van Wolferen, H. ♦ Kuipers, L. ♦ van Hulst, N.F.
Sponsorship Minstry of Infrastructure & State Committee for Sci. Res
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
File Format PDF
Copyright Year ©2002
Language English
Subject Domain (in DDC) Technology ♦ Engineering & allied operations ♦ Applied physics
Subject Keyword Process design ♦ Laser modes ♦ Interference ♦ Lithography ♦ Resists ♦ Lattices ♦ Periodic structures ♦ Optical devices ♦ Slabs ♦ Geometrical optics
Abstract Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of holes.
Description Author affiliation: Lightwave Devices Group, Twente Univ., Enschede, Netherlands (Bostan, C.G.; de Ridder, R.M.; van Dorssen, I.; van Wolferen, H.; Kuipers, L.; van Hulst, N.F.)
ISBN 0780373758
Educational Role Student ♦ Teacher
Age Range above 22 year
Educational Use Research ♦ Reading
Education Level UG and PG
Learning Resource Type Article
Publisher Date 2002-04-21
Publisher Place Poland
Rights Holder Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Size (in Bytes) 68.07 kB


Source: IEEE Xplore Digital Library