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Author Muraoka, T. ♦ Kobayashi, K.
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
File Format PDF
Copyright Year ©2006
Language English
Subject Domain (in DDC) Technology ♦ Engineering & allied operations ♦ Applied physics
Subject Keyword Sputtering ♦ Voltage ♦ Electrons ♦ Cobalt ♦ Pressure measurement ♦ Fault location ♦ Cities and towns ♦ Productivity ♦ Manufacturing processes ♦ Semiconductor device manufacture
Abstract Cobalt sputtering has a disadvantage in the lost operation time resulting from unstable discharge when cobalt is deposited on the shield. We successfully achieved stable discharge by utilizing an ion gauge instead of an igniter, even during sputtering, to supply thermal electrons to the discharge space. This technique doubles productivity.
Description Author affiliation: Fujitsu Ltd., Aizuwakamatsu (Muraoka, T.; Kobayashi, K.)
ISBN 9784990413804
ISSN 1523553X
Educational Role Student ♦ Teacher
Age Range above 22 year
Educational Use Research ♦ Reading
Education Level UG and PG
Learning Resource Type Article
Publisher Date 2006-09-25
Publisher Place Japan
Rights Holder ISSM
Size (in Bytes) 745.51 kB
Page Count 2
Starting Page 385
Ending Page 386

Source: IEEE Xplore Digital Library