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Author Kahng, A.B. ♦ Pati, Y.C.
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
File Format PDF
Copyright Year ©1999
Language English
Subject Domain (in DDC) Technology ♦ Engineering & allied operations
Subject Keyword Lithography ♦ Electronic design automation and methodology ♦ Optical distortion ♦ CMOS technology ♦ Shape ♦ Geometrical optics ♦ Image motion analysis ♦ Optical design ♦ Pulp manufacturing ♦ Optical control
Abstract This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in the interface between layout design and manufacturability. We review control of optical process effects by optical proximity correction (OPC) and phase-shifting masks (PSM), then focus on the implications of OPC and PSM for layout synthesis and verification methodologies. Our discussion addresses the necessary changes in the design-to-manufacturing flow, including infrastructure development in the mask and process communities, evolution of design methodology, and opportunities for research and development in the physical layout and verification areas of EDA.
Description Author affiliation: Dept. of Comput. Sci., California Univ., Los Angeles, CA, USA (Kahng, A.B.)
ISBN 1581130929
Educational Role Student ♦ Teacher
Age Range above 22 year
Educational Use Research ♦ Reading
Education Level UG and PG
Learning Resource Type Article
Publisher Date 1999-06-21
Publisher Place USA
Rights Holder Association for Computing Machinery, Inc. (ACM)
Size (in Bytes) 857.04 kB
Page Count 6
Starting Page 799
Ending Page 804


Source: IEEE Xplore Digital Library