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Author Smith, R.
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
File Format PDF
Copyright Year ©1998
Language English
Subject Domain (in DDC) Social sciences ♦ Education ♦ Technology ♦ Engineering & allied operations
Subject Keyword Laboratories ♦ Radio frequency ♦ Semiconductor device manufacture ♦ Safety ♦ Plasma applications ♦ Plasma chemistry ♦ Hazards ♦ Sputter etching ♦ Plasma materials processing ♦ Chemicals
Abstract Radio frequency power technology is an essential part of the fabrication of today's modern semiconductors. It would be virtually impossible to construct a high density multilevel device without the benefits provided by the use of RF power. While a basic course can be taught from a text, a course which has an associated hands-on lab offers much more, i.e. the opportunity to study the behavior of the system and make actual measurements. More and more, industry is looking for technicians and engineers who not only have a theoretical background in the technology, but also a real grasp of the nuts and bolts mechanics of the equipment they use. The goal of our program is to provide industry with an entry-level equipment technician. If graduates are to be assigned to an area of a semiconductor lab such as etch or thin films, he or she will need to be very familiar with the RF subsystems that are an integral part of the equipment or 'tool'. While it is unlikely a school will have the actual equipment that a graduate will encounter in industry, a program which has a balance of academics and lab experience can provide excellent preparation for the student. The author looks at the methodology in two parts: first, the author discusses the academic material that needs to be covered before the laboratory experience can be worth while, and secondly, the laboratory work itself.
ISBN 0780347625
ISSN 01905848
Educational Role Student ♦ Teacher
Age Range above 22 year
Educational Use Research ♦ Reading
Education Level UG and PG
Learning Resource Type Article
Publisher Date 1998-11-04
Publisher Place USA
Rights Holder Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Size (in Bytes) 308.55 kB
Page Count 3
Starting Page 1352
Ending Page 1354


Source: IEEE Xplore Digital Library