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Author Ikeda, S. ♦ Uehara, Y. ♦ Tagawa, I. ♦ Takeguchi, N. ♦ Kakehi, M.
Sponsorship IEEE Magnetics Society
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE)
File Format PDF
Copyright Year ©1965
Language English
Subject Domain (in DDC) Natural sciences & mathematics ♦ Physics ♦ Electricity & electronics ♦ Technology ♦ Engineering & allied operations ♦ Applied physics
Subject Keyword Magnetic properties ♦ Microstructure ♦ Magnetic films ♦ Magnetic recording ♦ Magnetic heads ♦ Iron ♦ Saturation magnetization ♦ Soft magnetic materials ♦ Conductivity ♦ Magnetic materials
Abstract Fe-N-Al-O alloy films were fabricated by RF reactive sputtering in a mixed Ar+N/sub 2/ plasma. The Al and O contents in films were varied by the area ratio of Al/sub 2/O/sub 3/ chips placed on an Fe target. We examined the effects of additional elements, such as Al and O, on magnetic and electrical properties of the Fe-N-Al-O films, and we investigated the relationship between soft magnetic properties and microstructure. The permeability reaches a maximum of about 1800, when the Al+O content range is 10-16 at%.
Description Author affiliation :: Fujitsu Labs. Ltd., Atsugi, Japan
ISSN 00189464
Education Level UG and PG
Learning Resource Type Article
Publisher Date 2000-09-01
Publisher Place U.S.A.
Rights Holder Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Volume Number 36
Issue Number 5
Size (in Bytes) 88.91 kB
Page Count 3
Starting Page 3470
Ending Page 3472

Source: IEEE Xplore Digital Library