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Author Kim, Ju-Ho ♦ Chung, Chin-Wook ♦ Kim, Young-Cheol
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword PLASMA PHYSICS AND FUSION TECHNOLOGY ♦ CHARGED PARTICLES ♦ DIFFUSION ♦ ELECTRON TEMPERATURE ♦ EXPERIMENT RESULTS ♦ ION DENSITY ♦ KINETICS ♦ PLASMA ♦ PRESSURE RANGE KILO PA ♦ PRESSURE RANGE MEGA PA 10-100 ♦ PROBES
Abstract The gap length effect on plasma parameters is investigated in a planar type inductively coupled plasma at various conditions. The spatial profiles of ion densities and the electron temperatures on the wafer level are measured with a 2D probe array based on the floating harmonic method. At low pressures, the spatial profiles of the plasma parameters rarely changed by various gap lengths, which indicates that nonlocal kinetics are dominant at low pressures. However, at relatively high pressures, the spatial profiles of the plasma parameter changed dramatically. These plasma distribution profile characteristics should be considered for plasma reactor design and processing setup, and can be explained by the diffusion of charged particles and the local kinetics.
ISSN 1070664X
Educational Use Research
Learning Resource Type Article
Publisher Date 2015-07-15
Publisher Place United States
Journal Physics of Plasmas
Volume Number 22
Issue Number 7


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