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Author Wang, J. ♦ Tolan, M. ♦ Seeck, O. H. ♦ Sinha, S. K. ♦ Bahr, O. ♦ Rafailovich, M. H. ♦ Sokolov, J.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword MATERIALS SCIENCE ♦ POLYMERS ♦ THIN FILMS ♦ X-RAY SPECTRA ♦ INELASTIC SCATTERING ♦ STRUCTURAL CHEMICAL ANALYSIS ♦ POLYSTYRENE ♦ ANNEALING ♦ THICKNESS ♦ SILICON ♦ INTERFACES
Abstract The surfaces of thermally annealed thin polystyrene films on silicon were investigated by specular and diffuse x-ray scattering. The data cannot be interpreted satisfactorily with capillary wave calculations assuming attractive van der Waals substrate film interactions. The analysis shows that polystyrene films coated on silicon substrates are in a strongly confined state even for film thicknesses much larger than the radius of gyration, possibly due to strong confinement that arises from the interaction at the polymer/substrate interface and the viscoelastic behavior of the thin films. {copyright} {ital 1999} {ital The American Physical Society }
ISSN 00319007
Educational Use Research
Learning Resource Type Article
Publisher Date 1999-07-01
Publisher Place United States
Journal Physical Review Letters
Volume Number 83
Issue Number 3


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