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Author Noel, M. ♦ Santhanam, R. ♦ Chidambaram, S.
Source CSIR-Central Electrochemical Research Institute
Content type Text
Publisher Springer-Verlag
File Format PDF
Copyright Year ©1999
Language English
Subject Domain (in DDC) Natural sciences & mathematics ♦ Chemistry & allied sciences
Subject Keyword Electroorganic
Abstract The stability of electrochemically formed NiF2 film in 1.0 M perchloric acid containing monovalent fluorides namely, NH4F, HF, NaF, KF and LiF, is investigated using cyclic voltammetry, chronoampe- rometry, atomic absorption spectroscopy and scanning electron microscopy. In addition to direct dissolution of nickel and dissolution through the oxide layer, a new mode of dissolution of NiF2 film as NiF�y 3 and NiF2�y 4 through complex formation is proposed. This process is significantly influenced by the alkali metal �uorides. On a comparative basis the stability of NiF2 decreases in the order NH4F HF KF LiF.
Educational Use Research
Education Level UG and PG
Learning Resource Type Article
Publisher Date 1999-01-01
Journal PeerReviewed