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Author Bardos, L. ♦ Barankova, H. ♦ Welzel, Th. ♦ Dani, I. ♦ Peter, S. ♦ Richter, F.
Sponsorship (US)
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Publisher The American Physical Society
Language English
Subject Keyword MATERIALS SCIENCE ♦ ANTENNAS ♦ CHEMICAL VAPOR DEPOSITION ♦ DEPOSITION ♦ ELECTRODES ♦ GEOMETRY ♦ HOLLOW CATHODES ♦ MIXTURES ♦ NITRIDES ♦ NITROGEN ♦ PHYSICAL VAPOR DEPOSITION ♦ PHYSICS ♦ PLASMA
Abstract Two nonconventional systems, the radio frequency hollow cathode discharge (RHCD) and the microwave antenna discharge (MWAD), with almost identical geometry of electrodes generating a nitrogen plasma at power level up to 60 W were compared. Both systems were used for deposition of nitride films at similar experimental parameters. The Al--N films were deposited in the RHCD system by reactive physical vapor deposition (PVD) using an Al radio frequency hollow cathode and the CN{sub x} films were deposited in the MWAD system by plasma activated chemical vapor deposition (PACVD) from N{sub 2}+1% (alternatively 0.5% or 0.4%) C{sub 2}H{sub 2} gas mixtures. The vibrational temperatures of nitrogen molecules in both systems were compared as functions of experimental parameters and discussed with respect to the film growth rates in the particular systems. It was found that irrespective of frequency difference of two orders of magnitude the vibrational temperatures of nitrogen molecules were similar, between 3000 and 4600 K, in both systems at similar experimental conditions. However, shapes of dependences of the vibrational temperature on particular parameters were different, due to different plasma generation principles. The nitride film growth rates were found to correlate to the vibrational temperatures of nitrogen molecules, but their dependences on experimental parameters were affected by specific features of the plasma generation in individual systems as well as by different mechanisms of the PVD and the PACVD of films. {copyright} 2001 American Institute of Physics.
ISSN 00218979
Educational Use Research
Learning Resource Type Article
Publisher Date 2001-08-15
Publisher Place United States
Journal Journal of Applied Physics
Volume Number 90
Issue Number 4


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