Access Restriction

Author Singh, Neerja ♦ Singh, Surinder
Source IACS Kolkata
Content type Text
Publisher Indian J. Phys.
File Format PDF
Language English
Subject Domain (in DDC) Natural sciences & mathematics ♦ Physics
Subject Keyword Lexan polymer ♦ Oxygen ion beam ♦ Bulk Etching
Abstract The polymer Lexan was irradiated to 80MeV O6+ ion beam using the 15UD pelletron at InterUniversity Accelerator Centre, New Delhi. The ion fluence ranging from 1011 to 3 × 1012 ions/cm2 has been usedto study the dose effects of irradiation on Lexan. By using the etching technique, it is observed that the bulk etchrate of the sample increases with increasing the ion influence, while the activation energy associated with itshow a decreasing trend which can be explained on the basis of polymer degradation.
Education Level UG and PG
Learning Resource Type Article
Journal Indian J Phys
Volume Number 83
Issue Number 7
Page Count 5
Starting Page 949
Ending Page 953