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Author Anand, Venu ♦ Shivashankar, S. A. ♦ Nair, Aswathi R. ♦ Mohan Rao, G.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ♦ ABSORPTION SPECTROSCOPY ♦ ACETYLENE ♦ AIR ♦ ARGON ♦ ATMOSPHERIC PRESSURE ♦ CHEMICAL VAPOR DEPOSITION ♦ FLOW RATE ♦ GAS FLOW ♦ INFRARED SPECTRA ♦ OXYGEN ♦ PLASMA ♦ POLYMERS ♦ PRESSURE RANGE KILO PA ♦ SIMULATION ♦ SUBSTRATES ♦ X-RAY PHOTOELECTRON SPECTROSCOPY
Abstract Gas discharge plasmas used for thinfilm deposition by plasma-enhanced chemical vapor deposition (PECVD) must be devoid of contaminants, like dust or active species which disturb the intended chemical reaction. In atmospheric pressure plasma systems employing an inert gas, the main source of such contamination is the residual air inside the system. To enable the construction of an atmospheric pressure plasma (APP) system with minimal contamination, we have carried out fluid dynamic simulation of the APP chamber into which an inert gas is injected at different mass flow rates. On the basis of the simulation results, we have designed and built a simple, scaled APP system, which is capable of holding a 100 mm substrate wafer, so that the presence of air (contamination) in the APP chamber is minimized with as low a flow rate of argon as possible. This is examined systematically by examining optical emission from the plasma as a function of inert gas flow rate. It is found that optical emission from the plasma shows the presence of atmospheric air, if the inlet argon flow rate is lowered below 300 sccm. That there is minimal contamination of the APP reactor built here, was verified by conducting an atmospheric pressure PECVD process under acetylene flow, combined with argon flow at 100 sccm and 500 sccm. The deposition of a polymer coating is confirmed by infrared spectroscopy. X-ray photoelectron spectroscopy shows that the polymer coating contains only 5% of oxygen, which is comparable to the oxygen content in polymer deposits obtained in low-pressure PECVD systems.
ISSN 00036951
Educational Use Research
Learning Resource Type Article
Publisher Date 2015-08-31
Publisher Place United States
Journal Applied Physics Letters
Volume Number 107
Issue Number 9


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