Thumbnail
Access Restriction
Open

Author Reddy, R. Subba ♦ Sreedhar, A. ♦ Uthanna, S.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword MATERIALS SCIENCE ♦ CHEMICAL COMPOSITION ♦ CRYSTAL STRUCTURE ♦ CRYSTALS ♦ DOPED MATERIALS ♦ ELECTRIC CONDUCTIVITY ♦ EV RANGE ♦ FILMS ♦ MAGNETRONS ♦ MOLYBDENUM ♦ MORPHOLOGY ♦ NANOSTRUCTURES ♦ OPTICAL PROPERTIES ♦ SPUTTERING ♦ SUBSTRATES ♦ SURFACES ♦ TEMPERATURE DEPENDENCE ♦ X RADIATION ♦ ZINC OXIDES
Abstract Molybdenum doped zinc oxide (MZO) films were deposited on to glass substrates held at temperatures in the range from 303 to 673 K by reactive RF magnetron sputtering method. The chemical composition, crystallographic structure and surface morphology, electrical and optical properties of the films were determined. The films contained the molybdenum of 2.7 at. % in ZnO. The films deposited at 303 K were of X-ray amorphous. The films formed at 473 K were of nanocrystalline in nature with wurtzite structure. The crystallite size of the films was increased with the increase of substrate temperature. The optical transmittance of the films was in the visible range was 80–85%. The molybdenum (2.7 at %) doped zinc oxide films deposited at substrate temperature of 573 K were of nanocrystalline with electrical resistivity of 7.2×10{sup −3} Ωcm, optical transmittance of 85 %, optical band gap of 3.35 eV and figure of merit 30.6 Ω{sup −1}cm{sup −1}.
ISSN 0094243X
Educational Use Research
Learning Resource Type Article
Publisher Date 2015-08-28
Publisher Place United States
Volume Number 1675
Issue Number 1


Open content in new tab

   Open content in new tab