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Author Kalantar, D. H. ♦ Barbee, T. W. (Jr.) ♦ DaSilva, L. B. ♦ Glendinning, S. G. ♦ Weber, F. ♦ Weber, S. V. ♦ Key, M. H. ♦ Knauer, J. P.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword PLASMA PHYSICS AND FUSION ♦ LASER TARGETS ♦ X-RAY RADIOGRAPHY ♦ DIRECT DRIVE LASER IMPLOSION ♦ FOILS ♦ SILICON ♦ SPATIAL RESOLUTION ♦ X-RAY LASERS
Abstract A gain saturated yttrium x-ray laser operating at a wavelength of 15.5 nm has been used as an extreme ultraviolet probe to measure optical depth modulations in a thin Si foil by face-on radiography. The high brightness of this Ne-like x-ray laser allows probing of a sample with a high opacity. This technique is sensitive to very small modulations in the optical depth of the foil, corresponding to thickness variations of a few 10 nm of cold material. This technique is used to measure the effect of direct drive laser imprint on a thin Si foil by face-on radiography using multilayer optics to image the foil with 26{times} magnification. We have recorded modulations in a thin Si foil that was irradiated by a 400 ps, 0.35 {mu}m beam at an intensity of about 3{times}10{sup 12} W/cm{sup 2}. {copyright} {ital 1996 American Institute of Physics.}
ISSN 00346748
Educational Use Research
Learning Resource Type Article
Publisher Date 1996-03-01
Publisher Department Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Publisher Place United States
Journal Review of Scientific Instruments
Volume Number 67
Issue Number 3
Organization Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)


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