Thumbnail
Access Restriction
Open

Author Pradhan, P. C. ♦ Majhi, A. ♦ Nayak, M. ♦ Nand, Mangla ♦ Rajput, P. ♦ Biswas, A. ♦ Jha, S. N. ♦ Bhattacharyya, D. ♦ Sahoo, N. K. ♦ Shukla, D. K. ♦ Phase, D. M. ♦ Rai, S. K.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ♦ ABSORPTION ♦ ABSORPTION SPECTROSCOPY ♦ BORON CARBIDES ♦ DIFFUSE SCATTERING ♦ DIFFUSION ♦ FILMS ♦ HARD X RADIATION ♦ INTERFACES ♦ LAYERS ♦ MICROSTRUCTURE ♦ MORPHOLOGY ♦ NANOSTRUCTURES ♦ REFLECTIVITY ♦ SOFT X RADIATION ♦ THICKNESS ♦ TUNGSTEN COMPOUNDS ♦ X-RAY PHOTOELECTRON SPECTROSCOPY ♦ X-RAY SPECTROSCOPY
Abstract Interfacial atomic diffusion, reaction, and formation of microstructure in nanoscale level are investigated in W/B{sub 4}C multilayer (ML) system as functions of thickness in ultrathin limit. Hard x-ray reflectivity (XRR) and x-ray diffuse scattering in conjunction with x-ray absorption near edge spectroscopy (XANES) in soft x-ray and hard x-ray regimes and depth profiling x-ray photoelectron spectroscopy (XPS) have been used to precisely evaluate detailed interfacial structure by systematically varying the individual layer thickness from continuous-to-discontinuous regime. It is observed that the interfacial morphology undergoes an unexpected significant modification as the layer thickness varies from continuous-to-discontinuous regime. The interfacial atomic diffusion increases, the physical density of W layer decreases and that of B{sub 4}C layer increases, and further more interestingly the in-plane correlation length decreases substantially as the layer thickness varies from continuous-to-discontinuous regime. This is corroborated using combined XRR and x-ray diffused scattering analysis. XANES and XPS results show formation of more and more tungsten compounds at the interfaces as the layer thickness decreases below the percolation threshold due to increase in the contact area between the elements. The formation of compound enhances to minimize certain degree of disorder at the interfaces in the discontinuous region that enables to maintain the periodic structure in ML. The degree of interfacial atomic diffusion, interlayer interaction, and microstructure is correlated as a function of layer thickness during early stage of film growth.
ISSN 00218979
Educational Use Research
Learning Resource Type Article
Publisher Date 2016-07-28
Publisher Place United States
Journal Journal of Applied Physics
Volume Number 120
Issue Number 4


Open content in new tab

   Open content in new tab