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Author Meenakshi, M. ♦ Perumal, P. ♦ Sivakumar, R. ♦ Sanjeeviraja, C.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY ♦ DEPOSITION ♦ DOPED MATERIALS ♦ GLASS ♦ LASER RADIATION ♦ SPUTTERING ♦ SUBSTRATES ♦ THIN FILMS ♦ TUNGSTATES ♦ TUNGSTEN OXIDES ♦ VANADATES ♦ VANADIUM OXIDES ♦ X-RAY DIFFRACTION
Abstract V{sub 2}O{sub 5} doped WO{sub 3} targets for RF sputtering thin film deposition were prepared for various compositions. Thin films of (WO{sub 3}){sub 1-x} (V{sub 2}O{sub 5}){sub x} were deposited on to glass substrates using these targets. Structural characteristics of the prepared targets and thin films were studied using X-ray diffraction. Laser Raman studies were carried out on the thin films to confirm the compound formation.
ISSN 0094243X
Educational Use Research
Learning Resource Type Article
Publisher Date 2016-05-23
Publisher Place United States
Volume Number 1731
Issue Number 1


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