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Author Belevtsev, A. A. ♦ Kazantsev, S. Yu ♦ Saifulin, A. V. ♦ Firsov, K. N.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ♦ CATHODES ♦ CHEMICAL LASERS ♦ ELECTRIC DISCHARGES ♦ ELECTRIC FIELDS ♦ GEOMETRY ♦ IODIDES ♦ IODINE ♦ OXYGEN ♦ PLASMA ♦ STABILITY ♦ SULFUR FLUORIDES ♦ SURFACES ♦ ELECTRODES ♦ ELEMENTS ♦ FLUORIDES ♦ FLUORINE COMPOUNDS ♦ HALIDES ♦ HALOGEN COMPOUNDS ♦ HALOGENS ♦ IODINE COMPOUNDS ♦ LASERS ♦ MATHEMATICS ♦ NONMETALS ♦ SULFUR COMPOUNDS
Abstract A volume self-sustained discharge (VSD) in iodides (C{sub 3}H{sub 7}I, C{sub 4}H{sub 9}I) and in their mixtures with SF{sub 6}, N{sub 2}, and O{sub 2} in the presence of small-scale inhomogeneities on the cathode surface is shown to develop in the form of a self-initiating volume discharge (SIVD), i.e., a volume discharge without any preionisation including discharge gaps with a strong edge enhancement of the electric field. Additions of SF{sub 6} or N{sub 2} to the iodides improves the stability and homogeneity of the SIVD, while adding up to 300 % (relative to the partial iodide pressure) of O{sub 2} to these mixtures has only an insignificant effect on the discharge stability. The possibility of SIVD initiation was modelled experimentally in a 1.5-L discharge volume. For the C{sub 4}H{sub 9}I:O{sub 2}:SF{sub 6}=0.083:0.25:0.67 mixture at a pressure of 72 Torr, the specific energy input into the discharge plasma ranged up to 130 J L{sup -1} in this geometry. A conclusion was drawn that the SIVD is promising for the production of atomic iodine in the pulsed and repetitively pulsed operating regimes of a chemical oxygen - iodine laser. (lasers)
ISSN 10637818
Educational Use Research
Learning Resource Type Article
Publisher Date 2003-06-30
Publisher Place United States
Journal Quantum Electronics
Volume Number 33
Issue Number 6


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