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Author Gullikson, E. M. ♦ Stearns, D. G.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword PHYSICS ♦ ULTRAVIOLET SPECTRA ♦ TRANSMISSION ELECTRON MICROSCOPY ♦ EXTREME ULTRAVIOLET RADIATION ♦ LIGHT SCATTERING ♦ MOLYBDENUM ♦ SILICON ♦ SPUTTERING ♦ DEPOSITION ♦ REFLECTIVE COATINGS ♦ ROUGHNESS
Abstract Asymmetric scattering of extreme ultraviolet light is observed from Mo/Si multilayers at normal incidence. The observed asymmetry is shown to depend on the geometry of the multilayer film deposition. However, atomic force microscopy (AFM) measurements of the top surface were isotropic, and there was no indication of columnar film growth either in the AFM or in TEM cross-sectional measurements. The scattering asymmetry is instead found to result from a skewed propagation of roughness within the multilayer. A modified film growth model is developed which describes this, and is also used to calculate the nonspecular scattering. The results of the model are in excellent agreement with the measurements. The scattering asymmetry can be used to determine the average deposition angle during the film growth. {copyright} {ital 1999} {ital The American Physical Society}
ISSN 01631829
Educational Use Research
Learning Resource Type Article
Publisher Date 1999-05-01
Publisher Place United States
Journal Physical Review, B: Condensed Matter
Volume Number 59
Issue Number 20


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