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Author Adams, D. P. ♦ Mayer, T. M. ♦ Swartzentruber, B. S.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword MATERIALS SCIENCE ♦ METALS ♦ FABRICATION ♦ IRON ♦ CHEMICAL VAPOR DEPOSITION ♦ MICROSTRUCTURE ♦ CVD ♦ LITHOGRAPHY ♦ STM ♦ NANOSTRUCTURES ♦ MICROSTRIP LINES
Abstract Nanometer-scale metal lines are fabricated onto Si(100) substrates by scanning tunneling microscope (STM) based lithography and subsequent chemical vapor deposition. An STM tip is first used to define areas for metal layer growth by electron stimulated desorption of adsorbed hydrogen. Exposure to Fe(CO){sub 5} at 275{degree}C results in preferential deposition of Fe onto Si dangling bond sites (i.e., depassivated areas defined by the STM tip), while the monohydride resist remains intact in surrounding areas. Fe metal lines with widths {approximately}10 nm are constructed using this selective-area, autocatalytic growth technique.
ISSN 00036951
Educational Use Research
Learning Resource Type Article
Publisher Date 1996-04-01
Publisher Department Sandia National Laboratory
Publisher Place United States
Journal Applied Physics Letters
Volume Number 68
Issue Number 16
Organization Sandia National Laboratory


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