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Author Bradley, R. Mark ♦ Hofsäss, Hans
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ♦ CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY ♦ INCIDENCE ANGLE ♦ ION BEAMS ♦ ION IMPLANTATION ♦ IONS ♦ NANOSTRUCTURES ♦ SOLIDS ♦ SPUTTERING ♦ SURFACES
Abstract A theory of the effect that ion implantation has on the patterns produced by ion bombardment of solid surfaces is introduced. For simplicity, the case of self-sputtering of an elemental material is studied. We find that implantation of self-ions has a destabilizing effect along the projected beam direction for angles of incidence θ that exceed a critical value. In the transverse direction, ion implantation has a stabilizing influence for all θ.
ISSN 00218979
Educational Use Research
Learning Resource Type Article
Publisher Date 2016-08-21
Publisher Place United States
Journal Journal of Applied Physics
Volume Number 120
Issue Number 7


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