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Author Cerisier, M. ♦ Attenborough, K. ♦ Jedryka, E. ♦ Wojcik, M. ♦ Nadolski, S. ♦ Van Haesendonck, C. ♦ Celis, J. P.
Sponsorship (US)
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Publisher The American Physical Society
Language English
Subject Keyword CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ♦ BUFFERS ♦ COBALT HYDROXIDES ♦ DEPOSITION ♦ ELECTROLYTES ♦ PH VALUE ♦ PHYSICS
Abstract A {sup 59}Co NMR experiment has been used to investigate the structure of two series of Co films with thicknesses varying from 5 to 400 nm which were electrodeposited on Cu at the electrolyte pH value of 2.1 and 3.7, respectively. It was shown that the overall structure of studied Co films consists of a very good quality fcc phase and a heavily faulted hcp phase in about equal proportions. The exceptions are very thin Co layers (below 20 nm) where the hcp structure was stabilized at pH 3.7 and overpotential of 0.9 V. This effect is attributed to the formation of hexagonal cobalt hydroxide in the early stage of deposition, which acts as a buffer layer stabilizing Co hcp structure. {copyright} 2001 American Institute of Physics.
ISSN 00218979
Educational Use Research
Learning Resource Type Article
Publisher Date 2001-06-01
Publisher Place United States
Journal Journal of Applied Physics
Volume Number 89
Issue Number 11


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