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Author Florence, S. Sasi ♦ Can, N. ♦ Adam, H. ♦ Sachan, P. ♦ Gupta, R. K. ♦ Arockiasamy, L. ♦ Umadevi, M.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword NANOSCIENCE AND NANOTECHNOLOGY ♦ ATOMIC FORCE MICROSCOPY ♦ CAPILLARIES ♦ CAPILLARY FLOW ♦ EQUIPMENT ♦ EVAPORATION ♦ NANOPARTICLES ♦ NANOSTRUCTURES ♦ PHOTOVOLTAIC EFFECT ♦ POLYSTYRENE ♦ REFLECTION ♦ SCANNING ELECTRON MICROSCOPY ♦ SILICON ♦ SUBSTRATES ♦ SURFACES ♦ THIN FILMS ♦ ZINC TELLURIDES
Abstract A novel approach to prepare micro patterns ZnTe nanostructures on Si (100) substrate using thermal evaporation is proposed by capillary Force Lithography (CFL) technique on a self-assembled sacrificial Polystyrene mask. Polystyrene thin films on Si substrates are used to fabricate surface micro-relief patterns. ZnTe nanoparticles have been deposited by thermal evaporation method. The deposited ZnTe nanoparticles properties were assessed by Atomic Force Microscope (AFM), Scanning Electron Microscope (SEM). SEM studies indicated that the particles are uniform in size and shape, well dispersed and spherical in shape. This study reports the micro-arrays of ZnTe nanoparticles on a self-assembled sacrificial PS mask using a capillary flow photolithography process which showed excellent, morphological properties which can be used in photovoltaic devices for anti-reflection applications.
ISSN 0094243X
Educational Use Research
Learning Resource Type Article
Publisher Date 2016-06-10
Publisher Place United States
Volume Number 1742
Issue Number 1


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