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Author Wang, P. S. P. ♦ Lü, H. E.
Source ACM Digital Library
Content type Text
Publisher Association for Computing Machinery (ACM)
File Format PDF
Language English
Abstract A fast parallel thinning algorithm for digital patterns is presented. This algorithm is an improved version of the algorithms introduced by Zhang and Suen [5] and Stefanelli and Rosenfeld [3]. An experiment using an Apple II and an Epson printer was conducted. The results show that the improved algorithm overcomes some of the disadvantages found in [5] by preserving necessary and essential structures for certain patterns which should not be deleted and maintains very fast speed, from about 1.5 to 2.3 times faster than the four-step and two-step methods described in [3] although the resulting skeletons look basically the same.
Description Affiliation: National Taiwan Univ., Taipei, Taiwan (Lü, H. E.) || Northeastern Univ., Boston, MA (Wang, P. S. P.)
Age Range 18 to 22 years ♦ above 22 year
Educational Use Research
Education Level UG and PG
Learning Resource Type Article
Publisher Date 2005-08-01
Publisher Place New York
Journal Communications of the ACM (CACM)
Volume Number 29
Issue Number 3
Page Count 4
Starting Page 239
Ending Page 242

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Source: ACM Digital Library