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Author Sapatnekar, Sachin
Sponsorship IEEE Computer Society
Source IEEE Xplore Digital Library
Content type Text
Publisher Institute of Electrical and Electronics Engineers, Inc. (IEEE) Computer Society
File Format PDF
Copyright Year ©1984
Language English
Subject Domain (in DDC) Computer science, information & general works ♦ Data processing & computer science
Subject Keyword Buildings ♦ Circuits ♦ Lithography ♦ Design for manufacture ♦ Manufacturing processes ♦ CMOS technology ♦ Books ♦ Design engineering ♦ High K dielectric materials ♦ Copper ♦ modeling variations ♦ design for manufacturability ♦ DFM ♦ yield ♦ nanoscale ♦ CMOS
Abstract This is a review of Design for Manufacturability and Yield for Nano-Scale CMOS (by Charles Chiang and Jamil Kawa). DFM is a rapidly growing field that uses design techniques to improve manufacturing yield. However, the dilution in the interface between design and manufacturing implies that today, to build a circuit with enhanced yield, a designer must know more about manufacturing than ever before. The first step to embracing yield considerations is to learn about them, and this book portrays the landscape of this area in an excellent way. It describes methods for modeling variations, optimizing them, and learning to design around them when they occur. The overall structure of this book is well thought out and logical, and the reader who peruses it will be rewarded with an excellent view of the field.
Description Author affiliation :: University of Minnesota
ISSN 07407475
Education Level UG and PG
Learning Resource Type Article
Publisher Date 2008-03-01
Publisher Place U.S.A.
Rights Holder Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Volume Number 25
Issue Number 2
Size (in Bytes) 364.90 kB
Page Count 2
Starting Page 194
Ending Page 195

Source: IEEE Xplore Digital Library