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Author Pu, N. ♦ Bokor, J. ♦ Jeong, S. ♦ Zhao, R.
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword MATERIALS SCIENCE ♦ PHOTOACOUSTIC EFFECT ♦ MOLYBDENUM ♦ SILICON ♦ LAYERS ♦ ULTRASONIC WAVES ♦ PHONONS ♦ THIN FILMS ♦ MIRRORS
Abstract We have used picosecond ultrasonics techniques to study the localized acoustic-phonon surface modes in Mo/Si multilayer reflectors for extreme ultraviolet lithography. Localized surface modes in the first (zone-boundary) and second (zone-center) gaps were simultaneously detected. Oscillation frequency as high as 0.873 THz was observed. An {ital alternating-pump} technique has been successfully demonstrated to enhance the signal-to-noise ratio by 10 dB. This technique can be used to improve the sensitivity for probing the surface modes in other multilayer thin-film structures. {copyright} {ital 1999 American Institute of Physics.}
ISSN 00036951
Educational Use Research
Learning Resource Type Article
Publisher Date 1999-01-01
Publisher Place United States
Journal Applied Physics Letters
Volume Number 74
Issue Number 2


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