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Author Zalutskaya, A. A. ♦ Prokaznikov, A. V.
Source SpringerLink
Content type Text
Publisher Pleiades Publishing
File Format PDF
Copyright Year ©2014
Language English
Subject Domain (in DDC) Technology ♦ Engineering & allied operations
Subject Keyword Surfaces and Interfaces, Thin Films
Abstract The effects of changes in the color of silicon plates with nanostructured surfaces versus the features of nanostructures are investigated. Vertical nanostructures with high aspect ratios are constructed via anisotropic two-stage plasma-assisted etching (Bosch process). The surface coloration is explained by the fact that incident radiation is partly trapped by waveguide edge modes and its remaining part is scattered at the surface. The surface-film color is related to the positive and negative curvature of the nanostructures formed as a result of the plasma-assisted process.
ISSN 10274510
Age Range 18 to 22 years ♦ above 22 year
Educational Use Research
Education Level UG and PG
Learning Resource Type Article
Publisher Date 2014-06-06
Publisher Place Moscow
e-ISSN 18197094
Journal Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Volume Number 8
Issue Number 3
Page Count 7
Starting Page 595
Ending Page 601


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Source: SpringerLink