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Author Rybkin, A. G. ♦ Usachov, D. Yu. ♦ Marchenko, D. E. ♦ Shikin, A. M. ♦ Adamchuk, V. K. ♦ Varykhalov, A. Yu. ♦ Rader, O.
Source SpringerLink
Content type Text
Publisher SP MAIK Nauka/Interperiodica
File Format PDF
Copyright Year ©2010
Language English
Subject Domain (in DDC) Technology ♦ Engineering & allied operations
Subject Keyword Surfaces and Interfaces, Thin Films
Abstract Quantum well states of sp-type in thin metal layers of aluminum on the W(110) surface were experimentally studied by angle-resolved photoelectron spectroscopy depending on the layer thickness in a range of about 1–15 monolayers. It is shown that the aluminum layer is formed in accordance with the Kurdyumov-Sachs orientation relationship. Modification of the quantum well state spectra is observed with the increase in the layer thickness. The changes of the energy of quantum well states with the formation of each new monolayer have a stepwise character. This behavior can be used to calibrate the thickness of the deposited film with an accuracy within fractions of a monolayer. To confirm the reliability of the calibration, the thickness of the formed layers was tested using the attenuation of the W4f $_{7/2}$ peak intensity.
ISSN 10274510
Age Range 18 to 22 years ♦ above 22 year
Educational Use Research
Education Level UG and PG
Learning Resource Type Article
Publisher Date 2010-06-08
Publisher Place Dordrecht
e-ISSN 18197094
Journal Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Volume Number 4
Issue Number 3
Page Count 4
Starting Page 401
Ending Page 404

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Source: SpringerLink