Access Restriction

Author Two-Dimensional, Impact A. General ♦ Baccus, B. ♦ Collard, D. ♦ Dubois, E. ♦ Morel, D.
Editor Baccarani, G.
Source CiteSeerX
Content type Text
File Format PDF
Subject Domain (in DDC) Computer science, information & general works ♦ Data processing & computer science
Subject Keyword Multilayer Process Simulator ♦ New Two-dimensional Multilayer Process Simulator ♦ Basic Processing Step Simulation ♦ Numerical Problem ♦ Self-aligned Polysilicon Bipolar Transistor ♦ Finite Element Method ♦ Multilayer Structure ♦ Advanced Silicon Technology
Abstract A new two-dimensional multilayer process simulator based on finite element method has been developed to accuratly study advanced silicon technologies. The basic processing steps simulation are presented and numerical problems arising from the multilayer structures are outlined. Finally, the capabilities of the program are demonstrated with the simulation of a self-aligned polysilicon bipolar transistor.
Educational Role Student ♦ Teacher
Age Range above 22 year
Educational Use Research
Education Level UG and PG ♦ Career/Technical Study