|Author||Yadav, P. K. ♦ Rai, S. K. ♦ Modi, M. H. ♦ Nayak, M. ♦ Lodha, G. S. ♦ Kumar, M. ♦ Chakera, J. A. ♦ Naik, P. A.|
|Source||United States Department of Energy Office of Scientific and Technical Information|
|Subject Keyword||CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY ♦ CARBON ♦ DEPOSITION ♦ INDUS-1 ♦ OPTICS ♦ PLASMA ♦ REFLECTIVITY ♦ ROUGHNESS ♦ SOFT X RADIATION ♦ SURFACES ♦ SYNCHROTRON RADIATION ♦ THIN FILMS ♦ TUNGSTEN|
|Abstract||Carbon contamination on optical elements is a serious issue in synchrotron beam lines for several decades. The basic mechanism of carbon deposition on optics and cleaning strategies are not fully understood. Carbon growth mechanism and optimized cleaning procedures are worldwide under development stage. Optimized RF plasma cleaning is considered an active remedy for the same. In present study carbon contaminated optical test surfaces (carbon capped tungsten thin film) are exposed for 30 minutes to four different gases, rf plasma at constant power and constant dynamic pressure. Structural characterization (thickness, roughness and density) of virgin samples and plasma exposed samples was done by soft x-ray (λ=80 Å) reflectivity measurements at Indus-1 reflectivity beam line. Different gas plasma removes carbon with different rate (0.4 to 0.65 nm /min). A thin layer 2 to 9 nm of different roughness and density is observed at the top surface of tungsten film. Ar gas plasma is found more suitable for cleaning of tungsten surface.|
|Learning Resource Type||Article|
|Publisher Place||United States|
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