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Author Powers, R. W. ♦ Doyle, M. V.
Sponsorship USDOE
Source United States Department of Energy Office of Scientific and Technical Information
Content type Text
Language English
Subject Keyword METALLURGY AND CERAMICS ♦ ALLOTROPY ♦ ATOMS ♦ CARBON ♦ DEFECTS ♦ DIFFUSION ♦ INTERSTITIAL ATOMS ♦ IRON ♦ IRON-ALPHA ♦ LATTICES ♦ MECHANICAL PROPERTIES ♦ NIOBIUM ♦ NITROGEN ♦ OXYGEN ♦ REACTION KINETICS ♦ SOLID SOLUTIONS ♦ TANTALUM ♦ TRANSITION METALS ♦ VANADIUM
Abstract Mechanical relaxation measurements are used extensively to obtain information on the diffusion rate of interstitial solute atoms in body-centered cubic metals. Such studies were stimulated by a model, developed by J. L. Snoek, which yielded a relationship between a relaxation time, an experimental parameter, and the diffusion coefficient of the solute atom. Although Snoek's model was confirmed very well for solid solutions of carbon or nitrogen in alpha -iroii, a number of anomalies were observed when relaxation studies were extended to the group V transition metals. An extensive experimental study was made of the factors that influence relaxation times. The anomalous behavior of the group VA metals can be accommodated within the framework of Snoek's model by taking account of the specific nature of solid solutions based on these metals. Diffusion data obtained by a varicty of relaxation techniques are presented for oxygen, nitrogen, and carbon iri vanadium, niobium (columbium), and tantalum. These data are in agreement with those obtained by the inore conventional concentration gradient techniques in the few instances where such information is available. The pattern of activation energies suggest that lattice strain consideratiors alone are insuffieient to explain the activation process involved in interstitial diffusion. (auth)
ISSN 00218979
Educational Use Research
Learning Resource Type Article
Publisher Date 1959-04-01
Publisher Department General Electric Research Lab., Schenectady, N.Y.
Journal Journal of Applied Physics
Volume Number 30
Organization General Electric Research Lab., Schenectady, N.Y.


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